MICRO
Advanced lithographic technologies for sub-micron elements
Contract nr. 86/2005 CEEX-Program RELANSIN
15.12.2005-30.08.2008
Partners: :
SC Optoelectronica-2001 SA,
UPB-CMMIP,
INCDFLPR,
CEFIN
Objectives
research in order to investigate the possibility in future to produce submicron passive elements through lithographic methods, to develop the existent technological base in order to develop advanced technological methods to verify the parameters of the obtained elements. This will be performed through objectives proposed for each year, stage and activity.
With this purpose the following problems will be solved:
- technical studying and documentation to clarify the global and European level ;
- studying the testing methods and trials for established parameters and optimal method selection
- establishing the necessary assets for elements trial according to selected methods;
- determining measurement uncertaintiespurchasing of the necessary assets in order to expend technology range
Innovative Aspects/research metodology:
In this project we will focus on possibility to produce in future submicron passive elements through lithographic methods and especially creation of the experimental possibilities forlaser lithography, testing and manufacturing of the parameters.
By enlarging the measurements range it is aimed to realize complex tries that include evolved methods and modern equipment, that will approach the global existing ones
Technological solutions for submicron elements manufacturing
Designing and manufacturing samples
Experience and measurement performing with the obtained samples
Rezults:
Effects of the estimated results application will be capitalized by developing new technologies and services, which still have not been assimilated in the national industry. Price and performances of these technologies and services will be able successfully compete with the existing ones on the market.
A new service market based on modern technologies will be created.In carring of this project we follow to achieve the following measurable objectives.
We believe that the most important measurable objective will be advanced laboratory technologies in order to investigate the possibility in future to produce submicron passive elements through lithographic methods, also an important measurable objective will be establishing of a research and development partnership in the nanotechnologies field.
A solid technological platform base will be established.
During the project development we also will be following:
development of minimum 2 technological procedures
2 published articles
training of at least 2 employees that will be able to work with developed technologies
Published articles:
1. Valentina LAZARESCU, Gianina DOBRESCU, Mihail F.LAZARESCU, Constantin LOGOFATU, Bogdan SAVU andGeorge A. STANCIU, Fractal analysis of the AFM imagesof sulfide-covered GaAs(00) surfaces, Scanning 28,2006
2. D. Mohanta, G.A. Ahmed, A. Choudhury, F. Singh,D.K. Avasthi, G. Boyer and G.A. Stanciu, Scanningprobe microscopy, luminescence and third harmonicgeneration studies of elongated CdS:Mn nanostructuresdeveloped by energetic oxygen-ion-impact, Eur. Phys.J. Appl. Phys. 35, 29-36 (2006
